Applied Materials Assigned Patent for Dry Cleaning of Silicon Surface for Solar Cell Applications
(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service
ALEXANDRIA, Va., Feb. 16 -- Applied Materials, Santa Clara, Calif., has been assigned a patent (8,372,753) developed by Virendra V S. Rana, Los Gatos, Calif., and Michael P. Stewart, Mountain View, Calif., for a "dry cleaning of silicon surface for solar cell applications."
The abstract of the patent published by the U.S. Patent and Trademark Office states: "A method and apparatus for cleaning layers of solar cell substrates is disclosed. The substrate is exposed to a reactive gas that may comprise neutral radicals comprising nitrogen and fluorine, or that may comprise anhydrous HF and water, alcohol, or a mixture of water and alcohol. The reactive gas may further comprise a carrier gas. The reactive gas etches the solar cell substrate surface, removing oxygen and other impurities. When exposed to the neutral radicals, the substrate grows a thin film containing ammonium hexafluorosilicate, which is subsequently removed by heat treatment."
The patent application was filed on June 28, 2010 (12/825,103). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,372,753&OS=8,372,753&RS=8,372,753
Written by Satyaban Rath; edited by Hemanta Panigrahi.
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