Applied Materials Assigned Patent for Process Gas Delivery for Semiconductor Process Chambers
(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service
ALEXANDRIA, Va., March 2 -- Applied Materials, Santa Clara, Calif., has been assigned a patent (8,382,897) developed by Kedarnath Sangam, Sunnyvale, Calif., and Anh N. Nguyen, Milpitas, Calif., for a "process gas delivery for semiconductor process chambers."
The abstract of the patent published by the U.S. Patent and Trademark Office states: "Methods for gas delivery to a process chamber are provided herein. In some embodiments, a method may include flowing a process gas through one or more gas conduits, each gas conduit having an inlet and an outlet for facilitating the flow of gas through the gas conduits and into a gas inlet funnel having a second volume, wherein each gas conduit has a first volume less than the second volume, and wherein each gas conduit has a cross-section that increases from a first cross-section proximate the inlet to a second cross-section proximate the outlet but excluding any intersection points between the gas inlet funnel and the gas conduit, and wherein the second cross-section is non-circular; and delivering the process gas to the substrate via the gas inlet funnel."
The patent application was filed on April 25, 2012 (13/456,189). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=83,82,897.PN.&OS=PN/83,82,897&RS=PN/83,82,897
Written by Amal Ahmed; edited by Jaya Anand.
(c) 2013 Targeted News Service
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