Arizona State University Assigned Patent
(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service
ALEXANDRIA, Va., March 2 -- Arizona State University, Scottsdale, Ariz. has been assigned a patent (8,383,520) developed by Michael Marrs, Phoenix, for a "method of etching organosiloxane dielectric material and semiconductor device thereof."
The abstract of the patent published by the U.S. Patent and Trademark Office states: "In some embodiments, a method of etching an organosiloxane dielectric material can include: (a) providing the organosiloxane dielectric material; (b) providing a patterned mask over the organosiloxane dielectric material; and (c) reactive ion etching the organosiloxane dielectric material. Other embodiments are disclosed in this application."
The patent application was filed on May 27, 2011 (13/118,240). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=83,83,520.PN.&OS=PN/83,83,520&RS=PN/83,83,520
Written by Kusum Sangma; edited by Anand Kumar.
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