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Kateeva Assigned Patent
(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service
ALEXANDRIA, Va., March 4 -- Kateeva, Menlo Park, Calif., has been assigned a patent (8,383,202) developed by Sass Somekh, Los Altos, Calif., and Eliyahu Vronsky, Los Altos, Calif., for a "method and apparatus for load-locked printing."
The abstract of the patent published by the U.S. Patent and Trademark Office states: "The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder."
The patent application was filed on Jan. 5, 2010 (12/652,040). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,383,202&OS=8,383,202&RS=8,383,202
Written by Arpi Sharma; edited by Anand Kumar.
AS0304AK0304-849492
(c) 2013 Targeted News Service
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