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Rohm and Haas Electronic Materials Assigned Patent
(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service
ALEXANDRIA, Va., March 16 -- Rohm and Haas Electronic Materials, Marlborough, Mass., has been assigned a patent (8,394,571) developed by Young Cheol Bae, Weston, Mass., Thomas Cardolaccia, Newton, Mass., and Yi Liu, Wayland, Mass., for "methods of forming electronic devices."
The abstract of the patent published by the U.S. Patent and Trademark Office states: "Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture."
The patent application was filed on June 28, 2010 (12/825,166). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=8,394,571.PN.&OS=PN/8,394,571&RS=PN/8,394,571
Written by Kusum Sangma; edited by Anand Kumar.
KS0316AK0316-854621
(c) 2013 Targeted News Service
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