Intermolecular Assigned Patent
(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service
ALEXANDRIA, Va., Aug. 30 -- Intermolecular, San Jose, Calif., and Globalfoundries, Grand Cayman, Cayman Islands, have been assigned a patent (8,518,765) developed by Anh Duong, Fremont, Calif., Clemens Fitz, Dresden, Germany, and Olov Karlsson, San Jose, Calif., for an "aqua regia and hydrogen peroxide HCl combination to remove Ni and NiPt residues."
The abstract of the patent published by the U.S. Patent and Trademark Office states: "A method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process is disclosed, including a multi-step residue cleaning, including exposing the substrate to an aqua regia solution, followed by an exposure to a solution having hydrochloric acid and hydrogen peroxide. The SC2 solution can further react with remaining platinum residues, rendering it more soluble in an aqueous solution and thereby dissolving it from the surface of the substrate."
The patent application was filed on June 5, 2012 (13/489,244). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=85,18,765.PN.&OS=PN/85,18,765&RS=PN/85,18,765
Written by Amal Ahmed; edited by Jaya Anand.
(c) 2013 Targeted News Service
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