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International Business Machines Assigned Patent for Single-mask Spacer Technique for Semiconductor Device Features
[February 24, 2014]

International Business Machines Assigned Patent for Single-mask Spacer Technique for Semiconductor Device Features


(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service ALEXANDRIA, Va., Feb. 24 -- International Business Machines, Armonk, N.Y., has been assigned a patent (8,652,901) developed by Chung H. Lam, Peekskill, N.Y., and Jing Li, Ossining, N.Y., for a "single-mask spacer technique for semiconductor device features." The patent application was filed on March 3, 2013 (13/783,388). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=5&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=248&f=G&l=50&co1=AND&d=PTXT&s1=20140218.PD.&s2=%28NY.ASST.%29&OS=ISD/02/18/2014+AND+AS/NY&RS=ISD/02/18/2014+AND+AS/NY Written by Sudarshan Harpal; edited by Jaya Anand.



SH0224JA0224-982065 (c) 2014 Targeted News Service

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